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| | Technical information | | Max wafer size | 8" |
| Operating system (OS) | DOS (WIN optional) |
| Remarks | Syst. available without mapping (CV92A) |
| | Typical Applications |
| Measure | Thickness and "K" value for low K & High K |
| Monitor | Carrier density on EPI & Ion implanted layer |
| Characterize | Low implant dose, blank wafers |
| Monitor | Intégrité des oxydes minces |
| Monitor | Furnace contamination |
| Characterize | Trap density at the interface |
| | Options & Accessories | | Other options & Accessories | DETAIL |
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